Self-aligned double patterning (SADP) has become a promising technique topush pattern resolution limit to sub-22nm technology node. Although SADPprovides good overlay controllability, it encounters many challenges inphysical design stages to obtain conflict-free layout decomposition. In thispaper, we study the impact on placement by different standard cell layoutdecomposition strategies. We propose a SADP friendly standard cellconfiguration which provides pre-coloring results for standard cells. Theseconfigurations are brought into the placement stage to help ensure layoutdecomposability and save the extra effort for solving conflicts in laterstages.
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